Selected studies of Metal Atom Interactions with Well-Defined Organic Surfaces
The Interaction of Vapor-Deposited Ti and Au with Molecular Wires, A.V. Walker, T.B. Tighe, J. Stapleton, B.C. Haynie, S. Upilli, D.L. Allara, N. Winograd, Appl.Phys.Lett., 2004, 84, 4008
The Dynamics of Noble Metal Penetration Through Methoxy-Terminated Organic Monolayers, A.V. Walker, T.B. Tighe, O. Cabarcos, M.D. Reinard, S. Uppili, B.C. Haynie, N. Winograd and D. L. Allara, JACS, 2004, 126, 3954-3963
Solvation of Zero-Valent Metals in Organic Thin Films, A.V. Walker, T.B. Tighe, M.D. Reinard, B.C. Haynie, D.L. Allara, N. Winograd, Chem Phys. Lett, 2003, 369, 615-620
Adventures in Molecular Electronics: How to Attach Wires to Molecules, B.C. Haynie, A.V. Walker, T.B. Tighe, D.L.Allara and N. Winograd, Appl.Surf.Sci, 2003, 203-204, 433-436
Bond Insertion, Complexation and Penetration Pathways of Vapor-Deposited Aluminum Atoms with HO- and CH3O-Terminated Organic Monolayers, G.L. Fisher, A.V. Walker, A.E. Hooper, T.B. Tighe, K.B. Bahnck, H.T. Skriba, M.D. Reinard, B.C Haynie, R.L. Opila, N. Winograd and D.L. Allara, JACS, 2002, 124, 5528-5541
Nucleation And Growth Of Vapor-Deposited Metal Films On Self-Assembled Monolayers Studied By Multiple Characterization Probes, A.V. Walker, G.L. Fisher, A.E. Hooper, T. Tighe, R.L. Opila, N. Winograd and D.L.. Allara, in Metallization of Polymers 2, E. Sacher, Ed., Kluwer/Academic/Plenum, NY, 2002
G.L. Fisher, A.E. Hooper, R.L. Opila, D.L. Allara and N. Winograd, The Interaction of Vapor-Deposited Al Atoms with -CO2H Groups at The Surface of a Self-Assembled Alkanethiolate Monolayer on Gold, J.Phys.Chem. B.,104, 3267-3273(2000)
A. Hooper, G.L. Fisher, K. Konstadinidis, D. Jung, H. Nyugen, R. Opila, R.W. Collins, N. Winograd, and D.L. Allara, Chemical Effects of Methyl and Methyl Ester Surface Groups on the Nucleation and Growth of Vapor-Deposited Aluminum Films, J.Am.Chem.Soc., 121, 8052-8064(1999)
G.L. Fisher, A. Hooper, R.O. Opila, D.R. Jung, D.L. Allara and N. Winograd, The Interaction between Vapor-Deposited Al Atoms and Methylester-terminated Self-Assembled Monolayers Studied by TOF-SIMS, XPS and IRS, J. Electron Spectrosc. and Related Phenomena, 98-99, 139-148(1999)
K. Konstadinidis, P. Zhang, R. L. Opila, and D. L. Allara, An in-situ X-ray photoelectron study of the interaction between vapor-deposited Ti atoms and functional groups at the surfaces of self-assembled monolayers, Surface.Sci. 338, 300-312(1995).